[19a-A17-1~12] 13.2 Insulator technology

[19a-A17-3] Molecular Dynamics Study on Dipole Layer Formation at high-k/SiO2 Interface: Replication of both positive and negative direction dipole layer

^○Kosuke Shimura¹, Masahiro Hashiguchi¹, Ryota Kunugi¹, Atsushi Ogura^3,5, Shinichi Satoh^4,5, Takanobu Watanabe^1,2,5 (Waseda Univ.¹, Waseda-INN², Meiji Univ.³, University of Hyogo⁴, JST-CREST⁵)

Keywords:high-k,ダイポール