The 75th JSAP Autumn Meeting, 2014

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13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[19a-A19-1~13] 13.3 Si Process・Interconnect・MEMS・Integration

Fri. Sep 19, 2014 9:00 AM - 12:30 PM A19 (E311)

11:30 AM - 11:45 AM

[19a-A19-10] Deposition of thin group-IV films using nanosilicon ballistic electron emitter

○Mamiko Yagi1, Ryutaro Suda1, Akira Kojima1, Mentek Romain1, Jun-ichi Shirakashi1, Nobuyoshi Koshida1 (Graduate School of Eng., Tokyo Univ. of Agri. & Technol.1)

Keywords:電子源,薄膜堆積,還元