[19a-S9-1~11] 8.3 Plasma deposition of thin film and surface treatment

△ [19a-S9-4] Dependence of RF power on film structures and electric properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition system

^○Hirotsugu Sugiura¹, Lingyun Jia¹, Da Xu¹, Masayuki Nakamura¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹)

Keywords:アモルファスカーボン,プラズマ励起化学気相堆積法