Enhancement of metal evaporation induced by hydrogen plasma and its application to high-rate deposition

Presentation information

Oral presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

Fri. Sep 19, 2014 9:00 AM - 12:00 PM S9 (S9)

10:15 AM - 10:30 AM

^○Hiromasa Ohmi¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹ (Osaka Univ.¹)

Keywords:水素,プラズマ,金属