[19p-A10-1~22] 6.3 Oxide-based electronics

[19p-A10-21] The effect of substrate biasing on growth of vanadium dioxide thin film by reactive sputtering

^○Kui Su¹, BintiAzhan NurulHanis¹, Kunio Okimura¹ (Tokai Univ.¹)

Keywords:vanadium dioxide