The 75th JSAP Autumn Meeting, 2014

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13. Semiconductors A (Silicon) » 13.2 Insulator technology

[19p-A17-1~11] 13.2 Insulator technology

Fri. Sep 19, 2014 2:00 PM - 5:00 PM A17 (E308)

2:30 PM - 2:45 PM

[19p-A17-3] Investigation of Al2O3 film characterization made by Atomic Layer Deposition method using H2O and O3 as oxidant source

○Yoshito Nozaki1, Tetsushi Sekiguchi1, Atsushi Hiraiwa1, Hiroshi Kawarada1 (Waseda Univ.1)

Keywords:ALD