The 75th JSAP Autumn Meeting, 2014

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Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-S10-1~18] 8.4 Plasma etching

Fri. Sep 19, 2014 2:15 PM - 7:00 PM S10 (S10)

2:15 PM - 2:30 PM

[19p-S10-1] [Young Scientist Oral Presentation Award Speech]（15min.）Highly Selective Etching of LaAlSiOx over Si using Fluorocarbon Gas Chemistry

○Matsuda Kazuhisa,Sasaki Toshiyuki,Omura Mitsuhiro,Sakai Itsuko,Hayashi Hisataka (Toshiba S&S Co.)

Keywords:LaAlSiOx,ドライエッチング,フルオロカーボンガス