[19p-S10-1~18] 8.4 Plasma etching

△ [19p-S10-2] Experimental proof of TSV plasma etching device for MinimalFab

^○Taisei Motomura^1,2, Kazunori Takahashi³, Yuji Kasashima¹, Kazuya Kikunaga¹, Fumihiko Uesugi¹, Akira Ando³, Arami Saruwatari¹, Hiroyuki Tanaka², Yoshiki Shimizu^1,2, Shizuka Nakano^1,2, Hisato Ogiso^1,2, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (AIST¹, MINIMAL², Tohoku Univ.³)

Keywords:プラズマエッチング,ミニマルファブ,TSV