[19p-S10-1~18] 8.4 Plasma etching

[19p-S10-4] Substrate Temperature Control by Pulsed Plasma with Real-time measurement

^○(DC)Takayoshi Tsutsumi¹, Yusuke Fukunaga¹, Kenji Ishikawa¹, Keigo Takeda¹, Hiroki Kondo¹, Takayuki Ohta², Masafumi Ito², Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹, Meijo Univ.²)

Keywords:基板,温度,制御