[19p-S10-1~18] 8.4 Plasma etching

[19p-S10-7] Precise etch profile control of Si by using multi-step cyclic process.

^○Motohiro Tanaka¹, Yasushi Sonoda¹, Yutaka Kouzuma¹, Masahiro Sumiya¹, Naoki Yasui¹ (Hitachi High-Technologies¹)

Keywords:プラズマエッチング