The 75th JSAP Autumn Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-S10-1~18] 8.4 Plasma etching

Fri. Sep 19, 2014 2:15 PM - 7:00 PM S10 (S10)

4:00 PM - 4:15 PM

[19p-S10-8] Study of process drift mechanism by metal by-product in Front End of Line (FEOL) process

Yoshito Kamaji1, Masahiro Sumiya1 (Hitachi High-tech1)

Keywords:エッチング,メタルクリーニング,MG/HK プロセス