[20a-PA3-1~7] 13.2 Insulator technology

[20a-PA3-6] Possibility of Dipole Formation at High-k/High-k Hetero-oxide Interface

^○Masahiro Hashiguchi¹, Kosuke Shimura¹, Ryota Kunugi¹, Toyohiro Chikyow³, Atsushi Ogura^4,6, Shinichi Satoh^5,6, Takanobu Watanabe^1,2,6 (Waseda Univ¹, Waseda-INN², NIMS³, Meiji Univ⁴, Univ. of Hyogo⁵, JST-CREST⁶)

Keywords:high-k, dipole