Simulation Study on Resist Shrinkage in Nanoimprint Lithography

Presentation information

Oral presentation

07. Beam Technology and Nanofabrication » 7.4 Nanoimprint

Sat. Sep 20, 2014 1:00 PM - 3:00 PM A13 (E304)

2:00 PM - 2:15 PM

^○(M1)Takamitsu Tochino¹, Kimiaki Uemura¹, Masaaki Yasuda¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (Osaka Pref.Univ.¹)

Keywords:ナノインプリントリソグラフィー,残留応力,収縮