The 75th JSAP Autumn Meeting, 2014

Presentation information

Oral presentation

07. Beam Technology and Nanofabrication » 7.4 Nanoimprint

[20p-A13-1~8] 7.4 Nanoimprint

Sat. Sep 20, 2014 1:00 PM - 3:00 PM A13 (E304)

2:00 PM - 2:15 PM

[20p-A13-5] Simulation Study on Resist Shrinkage in Nanoimprint Lithography

○(M1)Takamitsu Tochino1, Kimiaki Uemura1, Masaaki Yasuda1, Hiroaki Kawata1, Yoshihiko Hirai1 (Osaka Pref.Univ.1)

Keywords:ナノインプリントリソグラフィー,残留応力,収縮