[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

▼ [17p-F1-11] Deposition Rate of Carbon Films Fabricated by H-assisted Plasma CVD: Pressure and Interelectrode Distance Dependence

^○Xiao Dong¹, Kazunori Koga¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Naho Itagaki¹, Masaharu Shiratani¹ (kyushu University¹)

Keywords:堆積速度,圧力,電極間距離