[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

[17p-F1-13] Importance of Non-emissive Hydrogen Flux on Plasma Process for SiH₄/H₂ System

^○Hirotaka Katayama¹, Isao Yoshida¹, Shigeo Yata¹, Akira Terakawa¹ (Panasonic Corp.¹)

Keywords:水素ラジカル,プラズマシミュレーション,薄膜Si