The 61st JSAP Spring Meeting, 2014

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08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

Mon. Mar 17, 2014 2:00 PM - 6:15 PM F1 (F201)

5:15 PM - 5:30 PM

[17p-F1-13] Importance of Non-emissive Hydrogen Flux on Plasma Process for SiH4/H2 System

○Hirotaka Katayama1, Isao Yoshida1, Shigeo Yata1, Akira Terakawa1 (Panasonic Corp.1)

Keywords:水素ラジカル,プラズマシミュレーション,薄膜Si