[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

[17p-F1-14] The acceleration mechanism and the observation of RF bias enhanced neutral beam 2

^○Yasuaki Sakakibara¹, Yoshiyuki Kikuchi^1,2, Seiji Samukawa² (Tokyo Electron¹, Tohoku Univ.²)

Keywords:中性粒子ビーム支援化学気相成長法,SiCOH系低誘電率絶縁膜