The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

Mon. Mar 17, 2014 2:00 PM - 6:15 PM F1 (F201)

5:30 PM - 5:45 PM

[17p-F1-14] The acceleration mechanism and the observation of RF bias enhanced neutral beam 2

Yasuaki Sakakibara1, Yoshiyuki Kikuchi1,2, Seiji Samukawa2 (Tokyo Electron1, Tohoku Univ.2)

Keywords:中性粒子ビーム支援化学気相成長法,SiCOH系低誘電率絶縁膜