The 61st JSAP Spring Meeting, 2014

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08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

Mon. Mar 17, 2014 2:00 PM - 6:15 PM F1 (F201)

3:00 PM - 3:15 PM

[17p-F1-5] Deposition of resistance switching films by pulsed RF sputtering method

○Masahiro Tsukamoto1, Masaki Yamada1, Osamu Sakai1, Toshihiro Nakamura2 (Kyoto Univ.1, Osaka Electro-Communication Univ2)

Keywords:パルススパッタ