The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

Mon. Mar 17, 2014 2:00 PM - 6:15 PM F1 (F201)

3:15 PM - 3:30 PM

[17p-F1-6] Reduction treatment of resistance switching films with hydrazine produced by atmospheric pressure plasma.

Masaki Yamada1, Osamu Sakai1, Toshihiro Nakamura2 (Kyoto Univ.1, Osaka Electro-Communication Univ.2)

Keywords:プラズマスパッタ,抵抗スイッチング素子,ヒドラジン