[17p-F2-1~17] 8.2 Plasma measurements and diagnostics

[17p-F2-13] Non-contact of Substrate Temperature and Heat Fluxes during Plasma Processes

^○takayoshi tsutsumi¹, keigo takeda¹, kenji ishikawa¹, hiroki kondo¹, takayuki ohta², masafumi ito², makoto sekine¹, masaru hori¹ (Nagoya Univ.¹, Meijo Univ.²)

Keywords:温度,熱,基板