[17p-F2-1~17] 8.2 Plasma measurements and diagnostics

△ [17p-F2-2] Load Impedance Measurement Using Characteristic Impedance Monitoring Method for plasma process monitoring

^○Taisei Motomura¹, Yuji Kasashima¹, Osamu Fukuda¹, Fumihiko Uesugi¹, Hiroyuki Kurita², Naoya Kimura² (AIST¹, ADVANTEST Co., Ltd.²)

Keywords:プラズマ,インピーダンス,モニタリング