The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.1 Plasma production and control

[17p-F3-1~16] 8.1 Plasma production and control

Mon. Mar 17, 2014 2:00 PM - 6:15 PM F3 (F301)

3:00 PM - 3:15 PM

[17p-F3-5] Multi-charged ion beam extracted from the 2nd stage in the tandem type ECRIS

○(M2)Keisuke Yano1, Daiju Kimura1, Sho Kumakura1, Youta Imai1, Takuya Nishiokada2, Fuminobu Sato1, Yushi Kato1, Toshiyuki Iida1 (Osaka Univ.1, Osaka Univ.2)

Keywords:ECR,イオン源,イオンビーム