Development of a low-energy electron diffraction apparatus using field emitters sharpened by field-assisted reactive gas etching.

Presentation information

Oral presentation

07. Beam Technology and Nanofabrication » 7.7 Vacuum nanoelectronics and electron sources

Mon. Mar 17, 2014 1:30 PM - 5:45 PM F5 (F305)

1:45 PM - 2:00 PM

^○Megumi Kumon¹, Yuuta Chihara¹, Takeshi Nakagawa¹, Seigi Mizuno¹ (Kyushu Univ.¹)

Keywords:電界誘起ガスエッチング