The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.2 Insulator technology

[18a-D8-1~12] 13.2 Insulator technology

Tue. Mar 18, 2014 9:00 AM - 12:15 PM D8 (D215)

11:30 AM - 11:45 AM

[18a-D8-10] High-temperature memory retention properties of Al/Al2O3/Al-rich Al-O/SiO2/p-Si gate structure

○Shinya Ozaki1, Takeshi Kawae2, Akiharu Morimoto2 (Grad. School of Natural Sci. & Tech. Kanazawa Univ.1, College of Sci. & Eng. Kanazawa Univ.2)

Keywords:半導体,メモリ,電荷蓄積