The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.2 Insulator technology

[18p-D8-1~15] 13.2 Insulator technology

Tue. Mar 18, 2014 1:30 PM - 5:30 PM D8 (D215)

1:45 PM - 2:00 PM

△ [18p-D8-2] Al/Ge Simultaneous Oxidation Process by using Oxygen Neutral Beam for Ge Gate Stack

○Daiki Nakayama1, Takeo Ohno2, Masaki Kitajo1, Seiji Samukawa1,2 (IFS, Tohoku Univ.1, WPI-AIMR, Tohoku Univ.2)

Keywords:Ge, SiGe, ひずみチャネル