The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.2 Insulator technology

[18p-D8-1~15] 13.2 Insulator technology

Tue. Mar 18, 2014 1:30 PM - 5:30 PM D8 (D215)

2:00 PM - 2:15 PM

[18p-D8-3] Low-temperature fabrication of Al2O3/Ge gate stacks using post plasma oxidation

○Yuta Nagatomi1, Yuichi Nagaoka1, Kesuke Yamamoto2, Dong Wang1, Hiroshi Nakashima2 (I-Eggs, Kyushu Univ.1, KASTEC, Kyushu Univ.2)

Keywords:Al2O3