The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[18p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

Tue. Mar 18, 2014 1:15 PM - 6:45 PM E14 (E302)

6:00 PM - 6:15 PM

△ [18p-E14-19] Theoretical Study of Deposition of Etchant Species in Silicon-dioxide Etching Process via Quantum Chemical Molecular Dynamics Method

○（D）Hiroshi Ito1, Takuya Kuwahara1, Yuji Higuchi1, Nobuki Ozawa1, Seiji Samukawa2, Momoji Kubo1 (Graduate School of Engineering, Tohoku Univ.1, Inst. of Fluid Science, Tohoku Univ.2)

Keywords:量子分子動力学,エッチング,シミュレーション