The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[18p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

Tue. Mar 18, 2014 1:15 PM - 6:45 PM E14 (E302)

6:15 PM - 6:30 PM

[18p-E14-20] Deposition of thin Si, Ge, and SiGe films using nanocryatalline silicon ballistic electron emitter

○Ryutaro Suda1, Mamiko Yagi1, Akira Kojima1, Mentek Romain1, Jun-ichi Shirakashi1, Nobuyoshi Koshida1 (Graduate School of Eng., Tokyo Univ. of Agri. & Technol.1)

Keywords:電子源,薄膜堆積,還元