[18p-F2-1~13] 7.3 Lithography

[18p-F2-11] Development of “Life extention of chamber”technology for ArF eximer lasers for semiconductor lithography tools

^○Akira Suwa¹, Hiroyuki Ikeda¹, Hisakazu Katsuumi¹, Takeshi Asayama¹, Hiroaki Tsushima¹, Takahito Kumazaki¹, Akihiko Kurosu¹, Takeshi Ohta¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton¹)

Keywords:ArFエキシマレーザ