[18p-F2-1~13] 7.3 Lithography

[18p-F2-2] Chemical reaction analysis of chemical amplified EUV resist by evaluating the thickness loss due to deprotection reaction

^○（M1）Kazuya Emura¹, Takeo Watanabe¹, Masato Yamaguchi¹, Hirohito Tanino¹, Tsubasa Hukui¹, Daiju Siono², Yuichi Haruyama¹, Yasuji Muramatu¹, Katsumi Ohmori², Kazufumi Sato², Tetsuo Harada¹, Hiroo Kinoshita¹ (Univ. of Hyogo¹, Tokyo Ohka²)

Keywords:EUV,レジスト