[18p-F2-1~13] 7.3 Lithography

[18p-F2-3] Resolution improvement by low temperature development in non-chemically amplified EUV resist

^○masato yamaguchi¹, kazuya emura¹, tsubasa hukui¹, hirohito tanino¹, tetsuo harada¹, takeo watanabe¹, hiroo kinosita¹, ryoiti hosino² (Univercity of Hyogo¹, Gluon Lab²)

Keywords:レジスト