[18p-F2-1~13] 7.3 Lithography

[18p-F2-4] Removal mechanism of ion-implanted photoresists by the hydrogen radical generated using hot-wire catalyzer

Ryuichi Wakatsuki¹, Yusuke Noto¹, ^○Takashi Nishiyama¹, Eriko Sato², Hideo Horibe² (Kanazawa Inst. Tech.¹, Grad. Sch. of Eng., Osaka City Univ.²)

Keywords:水素ラジカル,レジスト除去