The 61st JSAP Spring Meeting, 2014

Presentation information

Poster presentation

15. Crystal Engineering » 15.3 III-V-group epitaxial crystals

[18p-PG6-1~15] 15.3 III-V-group epitaxial crystals

Tue. Mar 18, 2014 1:30 PM - 3:30 PM PG6 (G棟2階)

1:30 PM - 3:30 PM

[18p-PG6-12] Study of high background doping in p-type GaAsN grown by chemical beam epitaxy

○(D)Omar Elleuch1, Hiroyuki Kowaki1, Boussairi Bouzazi1, Kazuma Ikeda1, Nobuaki Kojima1, Yoshio Ohshita1, Masafumi Yamaguchi1 (Toyota Technological Institute1, Toyota Technological Institute2, Toyota Technological Institute3, Toyota Technological Institute4, Toyota Technological Institute5, Toyota Technological Institute6, Toyota Technological Institute7)

Keywords:GaAsN, chemical beam epitaxy,GaAsN, chemical beam epitaxy,GaAsN, chemical beam epitaxy