[19a-D2-1~11] 16.2 Processing technologies and devices

[19a-D2-3] Dependence of Fundamental Property of Solution-Processed a-Si:H Films on Annealing Time

^○（M2）Yoo Sakuma¹, Keisuke Ohdaira^1,2, Takashi Masuda^1,3, Zhongrong Shen^1,2, Hideyuki Takagishi^1,2, Tatsuya Shimoda^1,2,3 (JAIST¹, JST-ALCA², JST-ERATO³)

Keywords:溶液プロセス,液体シリコン,a-Si