[19a-E13-1~11] 15.4 III-V-group nitride crystals

[19a-E13-10] Characteristics of nitride films etched with Cl2 neutral-beam

^○Jitsuo Ohta¹, Halubai Sekhar², Tomohiro Kubota², Takeru Okada^2,4, Seiji Samukawa^2,3,4, Hiroshi Fujioka^1,4 (IIS, The Univ. of Tokyo¹, IFS, Tohoku Univ.², WPI-AIMR, Tohoku Univ.³, JST-CREST⁴)

Keywords:nitride,エッチング