The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[19a-E14-1~10] 13.3 Si Process・Interconnect・MEMS・Integration

Wed. Mar 19, 2014 9:00 AM - 11:45 AM E14 (E302)

11:30 AM - 11:45 AM

[19a-E14-10] Characterization of nMOSFET and MOS-capacitor Fabricated by Minimal Fab and Mega Fab Hybrid Process

Sommawan Khumpuang1,2, Masayoshi Nagao1, Takashi Matsukawa1, Kazuhiko Endo1, Meishoku Masahara1, Shiro Hara1,2 (AIST1, MINIMAL2)

Keywords:MOSFET,ハーフインチウェハ,ミニマルファブ