[19a-E14-1~10] 13.3 Si Process・Interconnect・MEMS・Integration

△ [19a-E14-8] Fabrication of High-Performance n-Channel Silicon Metal-Oxide-Semiconductor Field-Effect Transistors on Glass Substrate by Using Meniscus-Force-Mediated Local Layer Transfer Technique

^○Muneki Akazawa¹, Kohei Sakaike¹, Shogo Nakamura¹, Seiichiro Higashi¹ (Hiroshima Univ.¹)

Keywords:転写,単結晶Si,歪シリコン