The 61st JSAP Spring Meeting, 2014

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Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19a-F6-1~6] 8.4 Plasma etching

Wed. Mar 19, 2014 11:00 AM - 12:30 PM F6 (F306)

12:15 PM - 12:30 PM

[19a-F6-6] CH4/H2 plasma etching on gallium nitride at high temperature

○（M1）Takashi Kako1, Zecheng Liu1, Kenji Ishikawa1, Osamu Oda1, Keigo Takeda1, Hiroki Kondo1, Makoto Sekine1, Masaru Hori1 (Nagoya Univ.1)

Keywords:窒化ガリウム,etching