[19a-F8-1~12] 5.3 Optical Control

[19a-F8-1] Reduction of N-H bond in SiON thin film deposited by ECR plasma CVD method

^○Kota Okazaki¹, Hidetaka Nishi¹, Tai Tsuchizawa¹, Koji Yamada¹, Tsuyoshi Yamamoto¹ (NTT MI Lab.¹)

Keywords:Si フォトニクス,石英導波路,SiON導波路