The 61st JSAP Spring Meeting, 2014

Presentation information

Poster presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[19a-PA4-1~12] 8.3 Plasma deposition of thin film and surface treatment

Wed. Mar 19, 2014 9:30 AM - 11:30 AM PA4 (アリーナ)

9:30 AM - 11:30 AM

[19a-PA4-2] Characterization of Fluorinated Amorphous Carbon Thin Films Fabricated by Microwave Plasma Irradiation on Solid Thin Films of c-C4F8 Condensed at Cryogenic Temperature

Kyouhei Morikawa1, Kenji Wakou1, Haruka Soga1, Tetuya Satou1 (Univ.of Yamanashi1)

Keywords:フルオロカーボン,マイクロ波,フッ素