[19a-PA4-1~12] 8.3 Plasma deposition of thin film and surface treatment

[19a-PA4-2] Characterization of Fluorinated Amorphous Carbon Thin Films Fabricated by Microwave Plasma Irradiation on Solid Thin Films of c-C₄F₈ Condensed at Cryogenic Temperature

^○Kyouhei Morikawa¹, Kenji Wakou¹, Haruka Soga¹, Tetuya Satou¹ (Univ.of Yamanashi¹)

Keywords:フルオロカーボン,マイクロ波,フッ素