[19a-PA4-1~12] 8.3 Plasma deposition of thin film and surface treatment

[19a-PA4-3] Characterization of a-Si:H:F Thin Films Fabricated by Low-energy Electron Beam Irradiation on Solid Thin Films of Silicon Tetrafluoride Formed at Cryogenic Temperature.

^○Nao Sakamaki¹, Ryutaro Yamada¹, Tetsuya Sato¹, Kiyokazu Nakagawa¹ (Univ. of Yamanashi¹)

Keywords:a-Si,四フッ化ケイ素,極低温