[19a-PA4-1~12] 8.3 Plasma deposition of thin film and surface treatment

[19a-PA4-6] Production of RF magnetron plasma with arrangement of monopole magnets for target utilization improvement of transparent conductive oxide film deposition

^○Yasunori Ohtsu¹, Masakazu Shigyo¹, Akihiro Aoyagi¹, Morito Akiyama², Tatsuo Tabaru² (Saga Univ¹, AIST²)

Keywords:マグネトロンスパッタ,単極磁場,ターゲット浸食