[19a-PA4-1~12] 8.3 Plasma deposition of thin film and surface treatment

[19a-PA4-5] Study on the high speed sputtering deposition process using powder target

^○Hiroahru Kawasaki¹, Tamiko Ohshima¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Yuki Tanaka¹, Yoshiaki Suda¹ (Sasebo National College of Tech.¹)

Keywords:powder target