[19a-PA4-1~12] 8.3 Plasma deposition of thin film and surface treatment

[19a-PA4-8] Changes in the local atomic structure in SiNx films grown by VHF-PECVD

^○Shin-ichi Kobayashi¹ (Tokyo Polytechnic Univ.¹)

Keywords:窒化シリコン膜,化学的気相成長,プラズマ成膜