[19p-D6-1~18] 6.4 New thin-film materials

[19p-D6-16] Effect of O₂ introduction Al doped CeO₂ thin films deposited by sputtering method (1)

^○Kenta Hara¹, Takuya Okazaki¹, Yuki Notani¹, Takashi Osawa¹, Keisuke Hibino¹, Setsu Suzuki², Keiji Ishibashi², Yasuhiro Yamamoto¹ (Hosei Univ.¹, Comet Inc.²)

Keywords:半導体,スパッタリング