Effect of O<sub>2</sub> introduction on Al doped CeO<sub>2</sub> thin films deposited by sputtering method (2)

Ｙｕｋｉ Notani

Presentation information

Oral presentation

06. Thin Films and Surfaces » 6.4 New thin-film materials

[19p-D6-1~18] 6.4 New thin-film materials

Wed. Mar 19, 2014 1:45 PM - 6:30 PM D6 (D209)

6:00 PM - 6:15 PM

[19p-D6-17] Effect of O₂ introduction on Al doped CeO₂ thin films deposited by sputtering method (2)

^○Ｙｕｋｉ Notani¹, Takuya Okazaki¹, Kenta Hara¹, Takashi Osawa¹, Keisuke Hibino¹, Setsu Suzuki², Keiji Ishibashi², Yasuhiro Yamamoto¹ (Hosei Univ.¹, Comet Inc.²)

Keywords:スパッタ法,CeO2

« Previous in this session
Next in this session »

▲

Presentation information

[19p-D6-1~18] 6.4 New thin-film materials

[19p-D6-17] Effect of O2 introduction on Al doped CeO2 thin films deposited by sputtering method (2)

[19p-D6-17] Effect of O₂ introduction on Al doped CeO₂ thin films deposited by sputtering method (2)