[19p-D6-1~18] 6.4 New thin-film materials

△ [19p-D6-9] Fabrication of high Indium ratio ZnInON by RF magnetron sputtering

^○Koichi Matsushima¹, Ryota Shimizu¹, Tomoaki Ide¹, Daisuke Yamashita¹, Kunihiro Kamataki¹, Hyunwoong Seo¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki^1,2 (Kyushu Univ.¹, JST-PRESTO²)

Keywords:ZnInON,sputtering,oxynitride