The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

14. Semiconductors B (Exploratory Materials, Physical Properties, Devices) » 14.3 Electron devices and Process technology

[19p-D8-1~13] 14.3 Electron devices and Process technology

Wed. Mar 19, 2014 2:00 PM - 5:30 PM D8 (D215)

4:00 PM - 4:15 PM

[19p-D8-8] Properties of ohmic contact to 2DEG of AlGaN/GaN strucutres depending on AlGaN layer thickness for different contact metals

Yusuke Takei1, Mari Okamoto1, Shin Man1, Rei Kayanuma1, Masayuki Kamiya1, Wataru Saito3, Kazuo Tsutsui1, Kuniyuki Kakushima1, Hitoshi Wakabayashi1, Yoshinori Kataoka2, Hiroshi Iwai2 (Tokyo Inst. Technology1, Tokyo Inst. Technology2, Toshiba3)

Keywords:AlGaN,エッチング,オーミックコンタクト